Bandwidth limiting methods for GaN power transistors

ABSTRACT

A transistor package includes a transistor and one or more bandwidth limiting matching networks. The one or more bandwidth limiting matching networks are coupled to one of a control contact and an output contact of the transistor in order to limit the gain response of the transistor outside of a predetermined frequency band. Specifically, the transistor package has a gain roll-off greater than 0.5 dB within 200 MHz of the predetermined frequency band, while providing signal losses less than 1.0 dB inside the predetermined frequency band at a power level greater than 240 W. By providing the bandwidth limiting matching networks in the transistor package, the gain response of the transistor may be appropriately limited in order to comply with the spectral masking requirements of one or more wireless communications standards, for example, Long Term Evolution (LTE) standards.

FIELD OF THE DISCLOSURE

The present disclosure relates to wide band-gap semiconductor devices.In particular, the present disclosure relates to bandwidth limited wideband-gap semiconductor devices.

BACKGROUND

As wireless communications standards continue to evolve to provideimprovements in data rates and reliability, increasingly stringentrequirements are placed on the radio frequency (RF) power amplifiers(PAs) used to transmit wireless signals. RF PAs compliant with thelatest wireless communication standards must provide a high degree oflinearity and a large gain over a wide bandwidth, while simultaneouslybeing highly efficient in order to preserve the battery life of a mobileterminal in which they are incorporated. Silicon (Si) and galliumarsenide (GaAs) RF PAs are well known and widely used, yet suffer from arelatively narrow bandwidth and a limited output power, characteristicswhich are inherent in the devices due to the narrow band-gap of theirrespective material systems. In order to improve the performance of amobile terminal, wide band-gap semiconductor devices are currently beingexplored for the amplification of RF signals.

Wide band-gap RF PAs such as those made from silicon carbide (SiC) andgallium nitride (GaN) offer improvements in bandwidth, output power, andefficiency when compared to their narrow band-gap counterparts. However,due to the increased price associated with wide band-gap devices, manymobile device manufacturers continue to rely on conventional RF PAs inthe design and manufacture of RF circuitry. While there are manycontributing factors to the increased price of wide band-gapsemiconductor devices, a large component of the cost is due to thepackaging thereof.

FIGS. 1 and 2 show a conventional package 10 for a wide band-gapsemiconductor device 12. The conventional package 10 includes a ceramicbody 14 and one or more metal contacts 16. Inside the package 10, an aircavity 18 surrounds the wide band-gap semiconductor device 12, which isattached to a metal substrate 20 via a die attach material 22. One ormore bond wires 24 couple the wide band-gap semiconductor device 12 to afirst metal contact 16A and a second metal contact 16B. The air cavity18 and the metal substrate 20 dissipate the heat generated by the wideband-gap semiconductor device 12, while simultaneously isolating andprotecting the wide band-gap semiconductor device 12 from the outsideenvironment. Although suitable for protecting even a wide band-gapsemiconductor device and dispersing the heat generated therefrom, theceramic body 14 and the metal substrate 20 of the conventional package10 are expensive to manufacture, thereby driving up the cost ofelectronics packages including wide band-gap semiconductor devices.

SUMMARY

The present disclosure relates to bandwidth limited wide band-gapsemiconductor devices. In one embodiment, a transistor package includesa transistor and one or more bandwidth limiting matching networks. Theone or more bandwidth limiting matching networks are coupled to one of acontrol contact and an output contact of the transistor in order tolimit the gain response of the transistor outside of a predeterminedfrequency band. Specifically, the transistor has a gain roll-off greaterthan 0.5 dB within 200 MHz of the predetermined frequency band and 7.5dB within 300 MHz of the predetermined frequency band, while providingsignal losses less than 1.0 dB inside the predetermined frequency bandat a power level greater than 240 W. By providing the bandwidth limitingmatching networks in the transistor package, the gain response of thetransistor may be appropriately limited in order to comply with thespectral masking requirements of one or more wireless communicationsstandards, for example, Long Term Evolution (LTE) standards.

In one embodiment, the transistor is a gallium nitride (GaN) transistor.Using a GaN transistor in the transistor package provides significantimprovements in the performance of the transistor package, for example,in the efficiency thereof. The one or more bandwidth limiting matchingnetworks may be provided to limit the inherently wide bandwidth of theGaN transistor in order to allow the GaN transistor to meet one or morespectral masking requirements.

Those skilled in the art will appreciate the scope of the presentdisclosure and realize additional aspects thereof after reading thefollowing detailed description of the preferred embodiments inassociation with the accompanying drawing figures.

BRIEF DESCRIPTION OF THE DRAWING FIGURES

The accompanying drawing figures incorporated in and forming a part ofthis specification illustrate several aspects of the disclosure, andtogether with the description serve to explain the principles of thedisclosure.

FIG. 1 is an isometric view of a conventional electronics package for asemiconductor device.

FIG. 2 is a cross-sectional view of the conventional electronics packagefor a semiconductor device shown in FIG. 1.

FIG. 3 is an isometric view of an electronics package for a wideband-gap semiconductor device according to one embodiment of the presentdisclosure.

FIG. 4 is a cross-sectional view of the electronics package shown inFIG. 3 according to one embodiment of the present disclosure.

FIG. 5 is a schematic illustrating a radio frequency (RF) transmit chainaccording to one embodiment of the present disclosure.

FIGS. 6A-6C are schematics illustrating a transistor package for use inthe RF transmit chain shown in FIG. 5 according to one embodiment of thepresent disclosure.

FIGS. 7A-7C are schematics illustrating an amplifier package for use inthe RF transmit chain shown in FIG. 5 according to an additionalembodiment of the present disclosure.

FIG. 8 is a schematic illustrating a bandwidth limiting matching networkfor use in the transistor package shown in FIGS. 6A-6C and/or theamplifier package shown in FIGS. 7A-7C according to one embodiment ofthe present disclosure.

FIG. 9 is a graph illustrating the peak output power response of thetransistor package shown in FIGS. 6A-6C and/or the amplifier packageshown in FIGS. 7A-7C according to one embodiment of the presentdisclosure.

DETAILED DESCRIPTION

The embodiments set forth below represent the necessary information toenable those skilled in the art to practice the embodiments andillustrate the best mode of practicing the embodiments. Upon reading thefollowing description in light of the accompanying drawing figures,those skilled in the art will understand the concepts of the disclosureand will recognize applications of these concepts not particularlyaddressed herein. It should be understood that these concepts andapplications fall within the scope of the disclosure and theaccompanying claims.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, these elements should notbe limited by these terms. These terms are only used to distinguish oneelement from another. For example, a first element could be termed asecond element, and, similarly, a second element could be termed a firstelement, without departing from the scope of the present disclosure. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items.

It will be understood that when an element such as a layer, region, orsubstrate is referred to as being “on” or extending “onto” anotherelement, it can be directly on or extend directly onto the other elementor intervening elements may also be present. In contrast, when anelement is referred to as being “directly on” or extending “directlyonto” another element, there are no intervening elements present.Likewise, it will be understood that when an element such as a layer,region, or substrate is referred to as being “over” or extending “over”another element, it can be directly over or extend directly over theother element or intervening elements may also be present. In contrast,when an element is referred to as being “directly over” or extending“directly over” another element, there are no intervening elementspresent. It will also be understood that when an element is referred toas being “connected” or “coupled” to another element, it can be directlyconnected or coupled to the other element or intervening elements may bepresent. In contrast, when an element is referred to as being “directlyconnected” or “directly coupled” to another element, there are nointervening elements present.

Relative terms such as “below” or “above” or “upper” or “lower” or“horizontal” or “vertical” may be used herein to describe a relationshipof one element, layer, or region to another element, layer, or region asillustrated in the Figures. It will be understood that these terms andthose discussed above are intended to encompass different orientationsof the device in addition to the orientation depicted in the Figures.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the disclosure.As used herein, the singular forms “a,” “an,” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises,”“comprising,” “includes,” and/or “including” when used herein specifythe presence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this disclosure belongs. It willbe further understood that terms used herein should be interpreted ashaving a meaning that is consistent with their meaning in the context ofthis specification and the relevant art and will not be interpreted inan idealized or overly formal sense unless expressly so defined herein.

FIGS. 3 and 4 show an electronics package 26 suitable for use with oneor more wide band-gap semiconductor devices 28 according to oneembodiment of the present disclosure. Specifically, FIG. 3 shows anisometric view of the electronics package 26, while FIG. 4 shows across-sectional view of the electronics package 26. The electronicspackage 26 includes an over-mold 30, one or more input/output pins 32,and a lead frame 34. The over-mold 30 may substantially surround the oneor more wide band-gap semiconductor devices 28, which are mounted on thelead frame 34 using a die attach material 38. The over-mold 30 may beformed of a plastic or a plastic polymer compound, which is injectionmolded around the lead frame 34 and the one or more wide band-gapsemiconductor devices 28, thereby providing protection from the outsideenvironment. The one or more wide band-gap semiconductor devices 28 maybe coupled to the one or more input/output pins 32 via bond wires 40.

The maximum temperature rating of conventional electronics packagingtechnologies using an over-mold have been capped at 150° C. due to thematerials used in the conventional electronics packaging. Accordingly,conventional electronics packaging technologies are generally suitableonly for narrow band-gap devices with a peak output power less than 150W and a frequency of operation less than 2.2 GHz. Due to the inherentlyhigh power density of wide band-gap devices, the packaging of a wideband-gap device is subject to far more stringent requirements than thepackaging of a similar narrow band-gap device. Specifically, the highpower density of a wide band-gap semiconductor device results in a largeamount of heat generated by the device, which must be properlydissipated by the packaging in order to avoid damage to the device.Further, due to the large amount of heat produced, the portion of thepackaging in contact with a wide band-gap semiconductor device shouldavoid excessive expansion and/or contraction when heated and cooled, asthis can damage the one or more devices in contact with the packaging.

Since wide band-gap semiconductor devices often operate at a peak outputpower greater than 200W, frequencies up to 3.8 GHz, and temperaturesgreater than 200° C., conventional electronics packaging technologiesare thus not suitable for wide band-gap devices rated at their fullcapacity. In designing an electronics package suitable for a wideband-gap semiconductor device, the inventors discovered four keycharacteristics for determining the suitability of a material used forthe over-mold 30. Specifically, the inventors discovered that the glasstransition temperature (T_(G)), the flexural modulus (F_(M)), thecoefficient of thermal expansion (CTE), and the moisture absorption rate(A_(R)) of the material used for the over-mold 30 are essential to theperformance and longevity of the electronics package 26.

The glass transition temperature (T_(G)) of a material indicates thetemperature at which a state change from a solid to a liquid begins tooccur, and is often used by electronics packaging designers tocharacterize the thermal capabilities of the material. The flexuralmodulus (F_(M)) of a material is the ratio of stress to strain in theflexural deformation of the material (e.g., the tendency for thematerial to bend). The coefficient of thermal expansion (CTE) of amaterial indicates how much a material changes in size as a result ofchanges in temperature of the material. Finally, the moisture absorptionrate (A_(R)) of a material indicates the amount (as a percentage) ofmoisture that a material will absorb under specified conditions.

Generally, an increase in the glass transition temperature (T_(G)) of agiven material will allow the material to be exposed to a greatertemperature without damage to the structure of the material. However, asthe glass transition temperature (T_(G)) of a material increases, so dothe flexural modulus (F_(M)), the coefficient of thermal expansion(CTE), and the moisture absorption rate (A_(R)) of the material. In thecourse of designing the electronics package 26, the inventors discoveredthat using materials with a high flexural modulus (F_(M)), coefficientof thermal expansion (CTE), and/or moisture absorption rate (A_(R)) forthe over-mold 30 may result in delamination of the over-mold 30 from thelead frame 34 and/or ripping, tearing, or other structural damage to theone or more wide band-gap semiconductor devices 28 in contact with theover-mold 30 due to expansion and contraction of the over-mold 30 as thetemperature of the one or more wide band-gap semiconductor devices 28changes over time. Accordingly, a balance must be struck between theglass transition temperature (T_(G)), the flexural modulus (F_(M)), thecoefficient of thermal expansion (CTE), and the moisture absorption rate(A_(R)) of the material used for the over-mold 30.

In one embodiment, the over-mold 30 of the electronics package 26 mayhave a glass transition temperature (T_(G)) between about 135° C. and400° C., a flexural modulus (F_(M)) below about 20 GPa, a coefficient ofthermal expansion (CTE) below about 50 ppm/° C. at temperatures abovethe glass transition temperature and below about 18 ppm/° C. attemperatures below the glass transition temperature, and a moistureabsorption rate (A_(R)) less than about 0.5%. In one embodiment, theover-mold 30 is formed from part no. G720A manufactured by SumitomoBakelite of Fukuoka, Japan, the data sheet of which is hereinincorporated by reference in its entirety. By using an over-mold 30 forthe electronics package 26 with a glass transition temperature (T_(G))between about 135° C. and 400° C., a flexural modulus (F_(M)) belowabout 20 GPa, a coefficient of thermal expansion (CTE) below about 50ppm/° C. at temperatures above the glass transition temperature andbelow about 18 ppm/° C. at temperatures below the glass transitiontemperature, and a moisture absorption rate (A_(R)) less than about0.5%, the electronics package 26 may be suitable for housing the one ormore wide band-gap semiconductor devices 28. Specifically, the highglass transition temperature (T_(G)) of the over-mold 30 allows theelectronics package 26 to handle the heat produced by the one or morewide band-gap semiconductor devices 28 within the electronics package 26without structural damage thereto, while the low flexural modulus(F_(M)), coefficient of thermal expansion (CTE), and moisture absorptionrate (A_(R)) of the over-mold 30 prevent damage to the one or more wideband-gap semiconductor devices 28 that may be caused due to deformationof the portion of the over-mold 30 in contact with the one or more wideband-gap semiconductor devices 28 due to thermal expansion and/orcontraction.

In addition to the characteristics discussed above with respect to theover-mold 30, the inventors also made similar discoveries with respectto the die attach material 38. Specifically, the inventors discoveredthat the bulk thermal conductivity (K_(T)) and the flexural modulus(F_(M)) of the die attach material 38 are essential to the performanceand longevity of the electronics package 26. The die attach material 38may be a sintered material, such as a sintered silver material with abulk thermal conductivity (K_(T)) between about 40 W/m-K and 200 w/m-K,and a flexural modulus (F_(M)) less than about 20 GPa. In oneembodiment, the die attach material 38 is part no. D591-3B manufacturedby Alpha Advanced Materials of Suwanee, Ga., the data sheet of which isherein incorporated by reference in its entirety. By using a die attachmaterial 38 for the electronics package 26 with a bulk thermalconductivity (K_(T)) between about 40 W/m-K and 200 W/m-K, and aflexural modulus (F_(M)) less than about 20 GPa, the electronics package26 may be suitable for housing the one or more wide band-gapsemiconductor devices 28. Specifically, the high bulk thermalconductivity (K_(T)) of the die attach material 38 ensures that adequateheat is conducted away from the one or more semiconductor devices 28,while the low flexural modulus (F_(M)) of the die attach material 38prevents damage to the one or more wide band-gap semiconductor devices28 that may be caused due to deformation of the portion of the dieattach material 38 in contact with the one or more wide band-gapsemiconductor devices 28 due to thermal expansion and/or contraction.

In the course of designing the electronics package 26, the inventorsfurther discovered that upper bound of the flexural modulus (F_(M)) ofthe die attach material 28 may depend on the area of the one or morewide band-gap semiconductor devices 28 in the electronics package 26.Accordingly, the particular material chosen for the die attach material28 may change depending on the area of the one or more wide band-gapsemiconductor devices 28 in the electronics package 26. In oneembodiment wherein the one or more wide band-gap semiconductor devices28 have an area less than 4 mm×4 mm, the flexural modulus (F_(M)) of thedie attach material 28 may be less than about 6 GPa. In an additionalembodiment wherein the one or more wide band-gap semiconductor devices28 have an area less than 2 mm×2 mm, the flexural modulus (F_(M)) of thedie attach material 28 may be less than about 10 GPa. In yet anadditional embodiment wherein the one or more wide band-gapsemiconductor devices 28 have an area less than 1 mm×1 mm, the flexuralmodulus (F_(M)) of the die attach material 28 may be less than about 20GPa. Similarly, the upper bound of the flexural modulus (F_(M)), thecoefficient of thermal expansion (CTE), and the moisture absorption rate(A_(R)) of the over-mold 30 may change depending on the area of the oneor more wide band-gap semiconductor devices 28 in the electronicspackage 26.

The input/output pins 32 and the lead frame 34 may be copper, copperalloy, or the like, however, any suitable materials for the input/outputpins 32 may be used without departing from the principles of the presentdisclosure.

Notably, using the electronics package 26 with the characteristicsdiscussed above allows for the accommodation of one or more wideband-gap semiconductor devices 28 while significantly reducing themanufacturing cost of the electronics package 26. Because the packagingof wide band-gap devices is a large component of the cost thereof, usingthe electronics package 26 may significantly reduce the cost ofelectronics packages that use wide band-gap devices. Further, due to thecharacteristics discussed above with respect to the electronics package26, the one or more wide band-gap semiconductor devices 28 may operateat full capacity, without being de-rated due to their packaging. In oneembodiment, the one or more wide band-gap semiconductor devices 28 arewide band-gap transistors configured to operate with a peak output poweraround 150 W at a frequencies above 2.2 GHz and up to 3.8 GHz. Inanother embodiment, the one or more wide band-gap semiconductor devices28 are wide band-gap transistors configured to operate with a peakoutput power around 200 W at a frequency up to 3.8 GHz. In yet anotherembodiment, the one or more wide band-gap semiconductor devices 28 arewide band-gap transistors configured to operate with a peak output poweraround 250 W at a frequency up to 3.8 GHz.

In one embodiment, the electronics package 26 meets moisture sensitivitylevel (MSL-3) and Joint Electron Device Engineering Council (JEDEC)environmental standards.

FIG. 5 shows a radio frequency (RF) transmit chain 42 according to oneembodiment of the present disclosure. The RF transmit chain 42 includesan input node RF_IN, an antenna 44, an input stage RF power amplifier(PA) 46, an output stage RF PA 48, and multiple matching networks 50.Specifically, the RF transmit chain 42 includes a first matching network50A coupled between the input node RF_IN and the input stage RF PA 46, asecond matching network 50B coupled between the input stage RF PA 46 andthe output stage RF PA 48, and a third matching network 50C coupledbetween the output stage RF PA 48 and the antenna 44. In operation, amodulated signal is presented at the input node RF_IN, where it isdelivered to the input stage RF PA 46 through the first matching network50A. The modulated signal is amplified by the input stage RF PA 46 anddelivered to the output stage RF PA 48 through the second matchingnetwork 50B. The output stage RF PA 48 then further amplifies themodulated signal to produce an RF output signal suitable fortransmission from the antenna 44, and delivers the RF output signal tothe antenna 44 through the third matching network 50C.

The matching networks 50 may be provided to match an impedance betweentwo different components, thereby ensuring the stable operation of theRF transmit chain 42 with minimal losses due to, for example, a highvoltage standing wave ratio (VSWR). Although three different matchingnetworks 50 are shown in the RF transmit chain 42, any number ofmatching networks 50 may be used in the RF transmit chain 42 withoutdeparting from the principles of the present disclosure. Further,although only one input stage RF PA 46 and one output stage RF PA 48 areshown in FIG. 5, any number of input stage or output stage RF PAs may beused in the RF transmit chain 42 without departing from the principlesof the present disclosure.

As discussed above, the RF transmit chain 42 needs to have a high degreeof linearity and a large gain over a wide bandwidth, whilesimultaneously being highly efficient. Accordingly, the input stage RFPA 46, the output stage RF PA 48, or both may be wide band-gap RF PAs inorder to increase the performance of the RF transmit chain 42.

FIG. 6A shows a transistor package 52 suitable for use as the inputstage RF PA 46, the output stage RF PA 48, or both in the RF transmitchain 42 shown in FIG. 5 according to one embodiment of the presentdisclosure. The transistor package 52 includes an input node RF_IN, awide band-gap transistor 54, a bandwidth limiting matching network 56,and an output node RF_OUT. The bandwidth limiting matching network 56 iscoupled between the input node RF_IN and the wide band-gap transistor54. The wide band-gap transistor 54 is coupled between the bandwidthlimiting matching network 56 and the output node RF_OUT. As discussedabove, using the wide band-gap transistor 54 may provide a high degreeof linearity and a large gain over a wide bandwidth. In some cases, thebandwidth of the transistor package 52 may be problematic, for example,due to one or more spectral masking requirements (e.g., as mandated by awireless communication standard with which the transistor package 52should comply). Accordingly, in order to reduce signal transmissionsoutside of a predetermined frequency band or bands, the bandwidthlimiting matching network 56 is provided in order to attenuate the gainof the wide band-gap transistor 54 when operating outside of thepredetermined frequency band or bands. In addition to attenuating thegain of the wide band-gap transistor 54 outside of the predeterminedfrequency band or bands, the bandwidth limiting matching network 56 mayalso match an external impedance coupled to the transistor package 52.The details of the bandwidth limiting matching network 56 are discussedin further detail below.

In one embodiment, the wide band-gap transistor 54 is a gallium nitride(GaN) transistor. In an additional embodiment, the wide band-gaptransistor 54 is a gallium nitride (GaN) on silicon carbide (SiC)transistor. In other embodiments, any number of wide band-gapsemiconductor material systems for the wide band-gap transistor 54 maybe used, all of which are contemplated herein. The wide band-gaptransistor 54 may be a high electron mobility transistor (HEMT).Accordingly, the bandwidth limiting matching network 56 may be coupledbetween the input node RF_IN and a gate contact (G) of the wide band-gaptransistor 54, the output node RF_OUT may be coupled to a drain contact(D) of the wide band-gap transistor 54, and a source contact (S) of thewide band-gap transistor 54 may be coupled to ground. In otherembodiments, the wide band-gap transistor 54 may be a field-effecttransistor (FET), a metal-oxide-semiconductor field-effect transistor(MOSFET), a bipolar junction transistor (BJT), an insulated gate bipolartransistor (IGBT), or the like.

The transistor package 52 is an integrated circuit packaged as adiscrete component. In other words, the transistor package 52 issuitable as a drop-in replacement for one or more conventional RF PAs.In one embodiment, the transistor package 52 is a monolithic integratedcircuit. As referred to herein, a monolithic integrated circuit is anintegrated circuit formed on a single semiconductor chip. In anadditional embodiment, the transistor package 52 is a hybrid integratedcircuit. As referred to herein, a hybrid integrated circuit is anintegrated circuit in which multiple inter-connected semiconductor chipsare provided on a substrate within a single package. Providing thebandwidth limiting matching network 56 inside of the transistor package52 allows the transistor package 52 to have a similar frequency responseto a conventional, narrow band-gap RF PA, but maintain a higher gain andefficiency while having lower losses than its conventional counterpart.Accordingly, the transistor package 52 may be used as a directreplacement for a conventional RF PA, thereby improving the performanceof an RF transmit chain in which the transistor package 52 isincorporated while requiring little to no redesign of the RF circuitryinterfacing with the transistor package 52.

In one embodiment, the transistor package 52 is an over-mold package asdescribed above with respect to FIGS. 3 and 4. Accordingly, thetransistor package 52 may include a plastic over-mold with a glasstransition temperature (T_(G)) between about 135° C. and 400° C., aflexural modulus (F_(M)) below about 20 GPa, a coefficient of thermalexpansion (CTE) below about 50 ppm/° C. at temperatures above the glasstransition temperature and below about 18 ppm/° C. at temperatures belowthe glass transition temperature, and a moisture absorption rate (A_(R))less than about 0.5%. Further, the transistor package 52 may be attachedto a lead frame using a die attach material with a bulk thermalconductivity (K_(T)) between about 40 W/m-K and 200 W/m-K, and aflexural modulus (F_(M)) less than about 20 GPa. Accordingly, the costof the transistor package 52 may be kept low while simultaneouslyproviding the performance improvements discussed above.

In one embodiment, the transistor package 52 has a peak output powergreater than 54 dBm (or 250 W) in the predetermined frequency band orbands. Further, due to the bandwidth limiting matching network 56, thetransistor package 52 has an average power output less than 48 W outsideof the predetermined frequency band or bands. The bandwidth limitingmatching network 56 may provide a gain roll-off greater than 0.5 dBwithin 200 MHz of the predetermined frequency band or bands, and a gainroll-off of 7.5 dB within 300 MHz of the predetermined frequency band orbands. Accordingly, the transistor package 52 may provide more than 240W of peak output power in the predetermined frequency band or bands, andless than 48 W of average output power outside of the predeterminedfrequency band or bands, wherein the average output power of thetransistor package 52 is measured according to a 7.5 dB peak-to-averageratio (PAR) for WCDMA. Further, the transistor package 52 may provide apeak output power greater than 240 W in the predetermined frequency bandor bands, and an average power output less than 48 W outside of thepredetermined frequency band or bands, wherein the average output powerof the transistor package 52 is defined as the output power of thetransistor package 52 when the transistor package 52 is driven atmaximum capacity over a 20% duty cycle. In one embodiment, thetransistor package 52 may provide an average power output above 80 W at2.6 GHz with 50 percent drain efficiency while transmitting 7.5 dB PARLong Term Evolution (LTE) signals at 50V, and have 17 dB of gain at therated output power. In an additional embodiment, the transistor package52 may deliver a saturation (P_(SAT)) efficiency greater than 65%.

In one embodiment, the predetermined frequency band or bands arefrequency bands used for RF communications. Accordingly, the bandwidthlimiting matching network 56 may pre-match one or more impedances at theRF frequencies while simultaneously limiting the bandwidth of the wideband-gap transistor 54. In one embodiment, the predetermined frequencyband or bands include one or more of the frequencies between 690-960MHz, 1800-2300 MHz, or 2300-2700 MHz.

FIG. 6B shows the transistor package 52 according to an additionalembodiment of the present disclosure. The transistor package 52 shown inFIG. 6B is similar to the transistor package 52 shown in FIG. 6A, butincludes the bandwidth limiting matching network 56 coupled between thewide band-gap transistor 54 and the output node RF_OUT, rather thanbetween the input node RF_IN and the wide band-gap transistor 54. Thetransistor package 52 may function in a substantially similar manner tothe transistor package 52 shown in FIG. 6A. That is, the bandwidthlimiting matching network 56 may reduce the gain response of the wideband-gap transistor 54 outside of a predetermined frequency band orbands in order to ensure that the transistor package 52 meets one ormore spectral masking requirements.

In one embodiment wherein the wide band-gap transistor 54 is a HEMT, thebandwidth limiting matching network 56 is coupled between the draincontact (D) of the wide band-gap transistor 54 and the output nodeRF_OUT, the input node RF_IN is coupled to the gate contact (G) of thewide band-gap transistor 54, and the source contact (S) of the wideband-gap transistor 54 is coupled to ground.

FIG. 6C shows the transistor package 52 according to yet anotherembodiment of the present disclosure. The transistor package 52 shown inFIG. 6C is similar to the transistor package 52 shown in FIG. 6A andFIG. 6B, but includes both a first bandwidth limiting matching network56A coupled between the input node RF_IN and the wide band-gaptransistor 54 and a second bandwidth limiting matching network 56Bcoupled between the wide band-gap transistor 54 and the output nodeRF_OUT. The transistor package 52 may function in a substantiallysimilar manner to the transistor package 52 shown in FIG. 6A and FIG.6B. That is, the first bandwidth limiting matching network 56A and thesecond bandwidth limiting matching network 56B may reduce the gainresponse of the wide band-gap transistor 54 outside of a predeterminedfrequency band or bands in order to ensure that the transistor package52 meets one or more spectral masking requirements.

In one embodiment wherein the wide band-gap transistor 54 is a HEMT, thefirst bandwidth limiting matching network 56A is coupled between theinput node RF_IN and the gate contact (G) of the wide band-gaptransistor 54, the second bandwidth limiting matching network 56B iscoupled between the drain contact (D) of the wide band-gap transistor 54and the output node RF_OUT, and the source contact (S) of the wideband-gap transistor 54 is coupled to ground.

FIG. 7A shows an amplifier package 58 suitable for use as the inputstage RF PA 46, the output stage RF PA 48, or both in the RF transmitchain 42 shown in FIG. 5 according to one embodiment of the presentdisclosure. The amplifier package 58 includes a first wide band-gaptransistor 60A, a second wide band-gap transistor 60B, and one or morebandwidth limiting matching networks 62. The bandwidth limiting matchingnetworks 62 are coupled between an input node RF_IN and the wideband-gap transistors 60. In some embodiments, the first wide band-gaptransistor 60A and the second wide band-gap transistor 60B are arrangedin a Doherty configuration. Providing multiple wide band-gap transistors60 in the amplifier package 58 may increase the gain and performance ofthe amplifier package 58 in some applications. As discussed above, thefirst wide band-gap transistor 60A and the second wide band-gaptransistor 60B may provide a high degree of linearity and a large gainover a wide bandwidth. In some cases, the bandwidth of the amplifierpackage 58 may be problematic, for example, due to one or more spectralmasking requirements. Accordingly, in order to reduce signaltransmissions outside of a predetermined frequency band or frequencybands, the bandwidth limiting matching networks 62 are provided in orderto attenuate the gain of the first wide band-gap transistor 60A and thesecond wide band-gap transistor 60B when operating outside of thepredetermined frequency band or frequency bands. In addition toattenuating the gain of the first wide band-gap transistor 60A and thesecond wide band-gap transistor 60B outside of the predeterminedfrequency band or bands, the bandwidth limiting matching networks 62 mayalso match an external impedance coupled to the amplifier package 58.The details of the bandwidth limiting matching networks 62 are discussedin further detail below.

In one embodiment, the first wide band-gap transistor 60A and the secondwide band-gap transistor 60B are GaN transistors. In an additionalembodiment, the first wide band-gap transistor 60A and the second wideband-gap transistor 60B are GaN on SiC transistors. A variety ofsuitable wide band-gap semiconductor materials systems for the firstwide band-gap transistor 60A and the second wide band-gap transistor 60Bexist, all of which are contemplated herein. The first wide band-gaptransistor 60A and the second wide band-gap transistor 60B may be HEMTs.Accordingly, a first bandwidth limiting matching network 62A may becoupled between the input node RF_IN and a gate contact (G) of the firstwide band-gap transistor 60A, a second bandwidth limiting matchingnetwork 62B may be coupled between the input node RF_IN and a gatecontact (G) of the second wide band-gap transistor 60B, a drain contact(D) of the first wide band-gap transistor 60A may be coupled to theoutput node RF_OUT, a source contact (S) of the first wide band-gaptransistor may be coupled to ground, a drain contact (D) of the secondwide band-gap transistor 60B may be coupled to the output node RF_OUT,and a source contact (S) of the second wide band-gap transistor 60B maybe coupled to ground. In other embodiments, the first wide band-gaptransistor 60A and the second wide band-gap transistor 60B may be FETs,MOSFETs, BJTs, IGBTs, or the like.

In one embodiment, the amplifier package 58 is an integrated circuitpackaged as a discrete component. In other words, the amplifier package58 is suitable as a drop-in replacement for one or more conventional RFPAs. In one embodiment, the amplifier package 58 is a monolithicintegrated circuit. In an additional embodiment, the amplifier package58 is a hybrid integrated circuit. Providing the bandwidth limitingmatching network 62 inside of the amplifier package 58 allows theamplifier package 58 to have a similar frequency response to aconventional, narrow band-gap RF PA, but maintain a higher gain andefficiency while having lower losses than its conventional counterpart.Accordingly, the amplifier package 58 may be used as a directreplacement for a conventional RF PA, thereby improving the performanceof an RF transmit chain in which the amplifier package 58 isincorporated and requiring little to no redesign of the RF circuitryinterfacing with the amplifier package 58.

In one embodiment, the transistor package 52 is an over-mold package asdescribed above with respect to FIGS. 3 and 4. Accordingly, thetransistor package 52 may include a plastic over-mold with a glasstransition temperature (T_(G)) between about 135° C. and 400° C., aflexural modulus (F_(M)) below about 20 GPa, a coefficient of thermalexpansion (CTE) below about 50 ppm/° C. at temperatures above the glasstransition temperature and below about 18 ppm/° C. at temperatures belowthe glass transition temperature, and a moisture absorption rate (A_(R))less than about 0.5%. Further, the transistor package 52 may be attachedto a lead frame using a die attach material with a bulk thermalconductivity (K_(T)) between about 40 W/m-K and 200 W/m-K, and aflexural modulus (F_(M)) less than about 20 GPa. Accordingly, the costof the transistor package 52 may be kept low while simultaneouslyproviding the performance improvements discussed above.

In one embodiment, the amplifier package 58 has a peak output powergreater than 54 dBm (or 250 W) in the predetermined band orpredetermined bands. Further, due to the bandwidth limiting matchingnetworks 62, the amplifier package 58 has an average output power lessthan 48 W outside of the predetermined band or predetermined bands. Thebandwidth limiting matching networks 62 may provide a gain roll-off of0.5 dB within 200 MHz of the predetermined band or predetermined bands,and a gain roll-off of 7.5 dB within 300 MHz of the predetermined bandor bands. Accordingly, the amplifier package 58 may provide more than240 W of peak output power in the predetermined band or predeterminedbands, and less than 48 W of average output power outside of thepredetermined band or predetermined bands, wherein the average outputpower of the amplifier package 58 is measured according to a 7.5 dB PARfor WCDMA. Further, the amplifier package 58 may provide a peak outputpower output greater than 240 W in the predetermined band orpredetermined bands, and an average power output less than 48 W outsideof the predetermined band or predetermined bands, wherein the averageoutput power of the amplifier package 58 is defined as the output powerof the amplifier package 58 when the amplifier package 58 is driven atmaximum capacity over a 20% duty cycle. In one embodiment, the amplifierpackage 58 may provide an average power output above 80 W at 2.6 GHzwith 50 percent drain efficiency while transmitting 7.5 dB PAR Long TermEvolution (LTE) signals at 50V, and have 17 dB of gain at the ratedoutput power. In an additional embodiment, the amplifier package 58 maydeliver a saturation (P_(SAT)) efficiency greater than 65%.

In one embodiment, the predetermined frequency band or bands arefrequency bands used for RF communications. Accordingly, the bandwidthlimiting matching networks 62 may pre-match one or more impedances atthe RF frequencies while simultaneously limiting the bandwidth of thewide band-gap transistors 60. In one embodiment, the predeterminedfrequency band or bands include one or more of the frequencies between690-960 MHz, 1800-2300 MHz, or 2300-2700 MHz.

FIG. 7B shows the amplifier package 58 according to an additionalembodiment of the present disclosure. The amplifier package 58 shown inFIG. 7B is similar to that shown in FIG. 7A, but includes the bandwidthlimiting matching networks 62 coupled between the wide band-gaptransistors 60 and the output node RF_OUT, rather than between an inputnode RF_IN and the wide band-gap transistors 60. The amplifier package58 may function in a substantially similar manner to the amplifierpackage 58 shown in FIG. 7A. That is, the bandwidth limiting matchingnetworks 62 may reduce the gain response of the first wide band-gaptransistor 60A and the second wide band-gap transistor 60B outside of apredetermined frequency band or bands in order to ensure that theamplifier package 58 meets one or more spectral masking requirements.

In one embodiment wherein the first wide band-gap transistor 60A and thesecond wide band-gap transistor 60B are HEMTs, the input node RF_IN iscoupled to the gate contact (G) of the first wide band-gap transistor60A and the gate contact (G) of the second wide band-gap transistor 60B,the source contact (S) of the first wide band-gap transistor 60A iscoupled to ground, the drain contact (D) of the first wide band-gaptransistor 60A is coupled to the output node RF_OUT through the firstbandwidth limiting matching network 62A, the drain contact (D) of thesecond wide band-gap transistor 60B is coupled to the output node RF_OUTthrough the second bandwidth limiting matching network 62B, and thesource contact (S) of the second wide band-gap transistor 60B is coupledto ground.

FIG. 7C shows the amplifier package 58 according to yet anotherembodiment of the present disclosure. The amplifier package 58 shown inFIG. 7C is substantially similar to that shown in FIG. 7A and FIG. 7B,but further includes a third bandwidth limiting matching network 62C anda fourth bandwidth limiting matching network 62D. The amplifier package58 may function in a substantially similar manner to the amplifierpackage 58 discussed above with respect to FIGS. 5A and 5B. That is, thebandwidth limiting matching networks 62 may reduce the gain response ofthe first wide band-gap transistor 60A and the second wide band-gaptransistor 60B in order to ensure that the amplifier package 58 meetsone or more spectral masking requirements.

In one embodiment wherein the first wide band-gap transistor 60A and thesecond wide band-gap transistor 60B are HEMTs, the first bandwidthlimiting matching network 62A is coupled between the input node RF_INand the gate contact (G) of the first wide band-gap transistor 60A, thesecond bandwidth limiting matching network 62B is coupled between thedrain contact (D) of the first wide band-gap transistor 60A and theoutput node RF_OUT, the source contact (S) of the first wide band-gaptransistor 60A is coupled to ground, the third bandwidth limitingmatching network 62C is coupled between the input node RF_IN and thegate contact (G) of the second wide band-gap transistor 62B, the fourthbandwidth limiting matching network 62D is coupled between the draincontact (D) of the second wide band-gap transistor 60B and the outputnode RF_OUT, and the source contact (S) of the second wide band-gaptransistor 60B is coupled to ground.

FIG. 8 shows an exemplary bandwidth limiting matching network 64, whichmay be used as the bandwidth limiting matching networks 56 shown inFIGS. 6A-6C and/or the bandwidth limiting matching networks 62 shown inFIGS. 7A-7C according to one embodiment of the present disclosure. Thebandwidth limiting matching network 64 includes an input node RF_IN, afirst inductor L1 coupled between the input node RF_IN and anintermediate node 66, a second inductor L2 and a first capacitor C1coupled in series between the intermediate node 66 and ground, a thirdinductor L3 coupled between the intermediate node 66 and an output nodeRF_OUT, and a second capacitor C2 coupled between the output node RF_OUTand ground. The second inductor L2 and the first capacitor C1 may act asa notch filter, which may attenuate the gain of an attached component ata predetermined frequency. The predetermined frequency is determined bythe inductance and/or capacitance chosen for the various components inthe bandwidth limiting matching network 64. The additional components inthe bandwidth limiting matching network 64 may match an impedancepresented to the input node RF_IN to an impedance presented at theoutput node RF_OUT in order to reduce interference in the circuit inwhich the bandwidth limiting matching network 64 is integrated.

Although the bandwidth limiting matching network 64 is shown including acertain number of components arranged in a particular fashion, manydifferent configurations for both the number and arrangement of thecomponents in the bandwidth limiting matching network 64 exist, all ofwhich are contemplated herein. The number and arrangement of thecomponents in the bandwidth limiting matching network 64 may changebased on the predetermined frequency band or bands over which a gainresponse is desired for the transistor package 52 and/or the amplifierpackage 58.

FIG. 9 is a graph illustrating the peak output power response of thetransistor package 52 shown in FIGS. 4A-4C wherein the predeterminedfrequency band is between about 2.4 GHz to 2.7 GHz. The solid line inFIG. 9 shows the peak output power response of the transistor package 52including the bandwidth limiting matching network 56, while the dashedline shows the power response of the transistor package 52 without thebandwidth limiting matching network 56. As shown in FIG. 9, the powerresponse of the transistor package 52 including the bandwidth limitingmatching network 56 rolls off at a significantly accelerated ratestarting at around 2.7 GHz, while the power response of the transistorpackage 52 without the bandwidth limiting matching network 56 remainsrelatively linear. Further, the power of the transistor package 52 islarge in the predetermined frequency band, peaking at around 55 dB.Accordingly, the transistor package 52 is easily able to meet one ormore spectral masking requirements with a minimal impact on the in-bandperformance of the transistor package 52.

Those skilled in the art will recognize improvements and modificationsto the preferred embodiments of the present disclosure. All suchimprovements and modifications are considered within the scope of theconcepts disclosed herein and the claims that follow.

What is claimed is:
 1. A transistor package comprising: a transistor;one or more bandwidth limiting matching networks, each of the one ormore bandwidth limiting matching networks coupled to one of an inputnode and an output node of the transistor and configured to limit a gainresponse of the transistor outside of a predetermined frequency band,wherein the one or more bandwidth limiting matching networks comprises afirst bandwidth limiting matching network that is coupled to either aninput or an output of the transistor, the first bandwidth limitingmatching network including a first inductor and a third inductor coupledin series between a radio frequency (RF) input of the first bandwidthlimiting matching network and an RF output of the first bandwidthlimiting matching network, and a second inductor and a first capacitorcoupled in series between a first node that is between the firstinductor and the third inductor and a reference voltage; a lead framehaving an upper surface to which the transistor and the one or morebandwidth limiting matching networks are attached via a die attachmaterial; and an over-mold surrounding the upper surface and sidesurfaces of the lead frame, the transistor, and the one or morebandwidth limiting matching networks, wherein the over-mold has a glasstransition temperature greater than 135° C., a flexural modulus lessthan about 20 GPa, a coefficient of thermal expansion below about 50ppm/C and a moisture absorption rate less than about 0.5%.
 2. Thetransistor package of claim 1 wherein the transistor is a galliumnitride (GaN) transistor, and wherein the first bandwidth limitingmatching network further comprises a second capacitor coupled between asecond node that is between the third inductor and the RF output and thereference voltage.
 3. The transistor package of claim 2 wherein the RFoutput of the first bandwidth limiting matching network is connected toa gate of the GaN transistor.
 4. The transistor package of claim 2wherein the RF input of the first bandwidth limiting matching network isconnected to a drain of the GaN transistor.
 5. The transistor package ofclaim 1 wherein the predetermined frequency band is between about 2.5GHz to about 2.7 GHz.
 6. The transistor package of claim 1 wherein thetransistor package is a monolithic integrated circuit.
 7. The transistorpackage of claim 1 wherein the transistor package is a hybrid integratedcircuit.
 8. The transistor package of claim 1 wherein the transistorpackage consists essentially of the transistor and the one or morebandwidth limiting matching networks.
 9. The transistor package of claim1 wherein the die attach material has a thermal resistance between about40 W/m-K and 200 W/m-K and a flexural modulus less than about 20 GPa.10. The transistor package of claim 1 wherein the die attach material isa sintered silver material.
 11. The transistor package of claim 1,wherein the transistor comprises a first transistor and the transistorpackage further includes a second transistor, and wherein the one ormore bandwidth limiting matching networks further comprises a secondbandwidth limiting matching network and a third bandwidth limitingmatching network, wherein the first and second transistors and the firstthrough third bandwidth limiting matching networks are coupled connectedin series.
 12. An amplifier package comprising: two or more transistors;and one or more bandwidth limiting matching networks, each of the one ormore bandwidth limiting matching networks coupled to one of an inputnode and an output node of one of the two or more transistors andconfigured to limit a gain response of the transistor outside of apredetermined frequency band a lead frame having an upper surface towhich the two or more transistors and the one or more bandwidth limitingmatching networks are attached via a die attach material; and anover-mold surrounding the upper surface and side surfaces of the leadframe, the two or more transistors, and the one or more bandwidthlimiting matching networks, wherein the over-mold has a glass transitiontemperature greater than 135° C., a flexural modulus less than about 20GPa, a coefficient of thermal expansion below about 50 ppm/C and amoisture absorption rate less than about 0.5%, wherein the die attachmaterial is a sintered die attach material.
 13. The amplifier package ofclaim 12 wherein the two or more transistors are gallium nitride (GaN)transistors.
 14. The amplifier package of claim 13 wherein the two ormore transistors are high electron mobility transistors (HEMTs).
 15. Theamplifier package of claim 14 wherein the input node is a gate contactof one of the two or more transistors and the output node is a draincontact of one of the two or more transistors.
 16. The amplifier packageof claim 12 wherein the two or more transistors are arranged in aDoherty configuration.
 17. The amplifier package of claim 12 wherein thepredetermined frequency band is between about 2.5 GHz to about 2.7 GHz.18. The amplifier package of claim 12 wherein each of the one or morebandwidth limiting matching networks is further configured to match animpedance presented at one of the input node and the output node of oneof the two or more transistors to an externally presented impedance. 19.The amplifier package of claim 12 wherein the amplifier package is amonolithic integrated circuit.
 20. The amplifier package of claim 12wherein the amplifier package is a hybrid integrated circuit.
 21. Theamplifier package of claim 12 wherein the amplifier package consistsessentially of the two or more transistors and the one or more bandwidthlimiting matching networks.
 22. The amplifier package of claim 12wherein the die attach material has a bulk thermal conductivity greaterthan about 40 W/m-K and a flexural modulus less than about 20 GPa. 23.The amplifier package of claim 12 wherein the two or more transistorshave an area of less 2 mm×2 mm and a flexural modulus of the die attachmaterial is less than about 10 Gpa.
 24. The amplifier package of claim12 wherein the two or more transistors have an area of less 1 mm×1 mmand a flexural modulus of the die attach material is less than about 10Gpa.
 25. The amplifier package of claim 12, wherein the one or morebandwidth limiting matching networks comprises a first bandwidthlimiting matching network that is coupled to either an input or anoutput of one of the transistors, the first bandwidth limiting matchingnetwork including a first inductor and a third inductor coupled inseries between a radio frequency (RF) input of the first bandwidthlimiting matching network and an RF output of the first bandwidthlimiting matching network, and a second inductor and a first capacitorcoupled in series between a first node that is between the firstinductor and the third inductor and a reference voltage.
 26. Theamplifier package of claim 25, wherein the first bandwidth limitingmatching network further comprises a second capacitor coupled between asecond node that is between the third inductor and the RF output and thereference voltage.